Nanofabrication
The $15 million Nanofabrication Facility is a multi-user with of 4,500 square feet of ultra clean fabrication space, with the remainder dedicated to support equipment and storage.
The facility is used to fabricate silicon and compound semi-conductor structures, films, circuits and devices on the nanometer scale. In particular, devices related to NEMS, MEMS, electronics, and photonics are routinely made.
Capabilities
* Deposition/Growth (MBE, CVD)
* Photolithography (Ebeam, UV, DUV)
* Etching (ICP, RIE)
* Characterization (XRD, TEM, PL, EL)
Equipment
* PECVD
* MBE Gen III
* MBE SVT
* Denton Sputtering System
* ICP