In our dedicated class-100 cleanroom, in addition to a wet fumehood and spinning/lithography, we have a custom two-chamber UHV ebeam deposition system. It has two e-guns and seven sources. We can take a sample from atmosphere down to the 10^-9 range in 20 mins for deposition of clean metallic multilayers. The HV chamber is for deposition of insulating oxides like sapphire.
We also have a local DI water system and a Nikon Nomarski microscope.
We built a custom UHV thermal evaporation chamber for metal-semiconductor bonding full 2" wafers.